The TEL NS300 wafer scrubber system provides 300mm process yield enhancement through unique cleaning methods. Based on the CLEAN TRACK ACT 12 platform, the TEL NS300 delivers reliable performance with a variety of particle removal processes. The system features all the cleaning methods of the 200mm SS-series scrubber as well as newly developed technologies

• Back side cleaning
• Pre diffusion cleaning

• FOUP(3 to 4)or open cassette
• CLEAN TRACK ACT 12 transfer method and software
• Vacuum and mechanical chuck for cleaning on both sides
• Variety of cleaning methods: Brush(for top side and back side)/Jet/Megasonic/Atomized Spray/SC-1
• CO₂ injection capability
• GEM host communication
• S2-0200 and CE mark compliance
• Ingenio:Simplification of data analysis by process data management, tool status monitoring function

• *CLEAN TRACK ACT is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.
• *Ingenio is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.