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Trias High-k CVD

Unity-EP CVD Ti/TiN

Trias High-k CVD is a 300mm single-wafer cluster tool designed to produce high-permittivity(high-k) materials required for advanced gate stack. TEL's Trias High-k CVD system combines highly-specialized 300mm process chambers(UVRF, High-k CVD, SPA and LPA), on a production-proven platform.

Applications

  • High-k gate stack formation

Features

  • Wafer size : 300mm
  • Number of process modules : 1 to 4
  • Processes : Interfacial layer formation, High-k deposition, Plasma nitridation, Anneal
  • *Trias is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries

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