The UNITY Me continues to achieve excellent cost performance, resulting in higher productivity and reliability. The UNITY Me delivers world-class process results on a wide range of plasma etch applications, including HARC, Dual Damascene, low-k dielectrics, poly gate, and shallow trench etch.

• DRM, SCCM Chambers
• Maximum four chambers capability
• High throughput, compact design and lower CoO
• Ease of maintenance
• Flow Control System

• *UNITY is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.
• *SCCM is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.