The Tactras represents TEL's latest solution for plasma etching. Using Tokyo Electron's advanced know-how in both robotics and plasma etch, the Tactras brings 45nm etch productivity to an unprecedented level. The mainframe supports 6 chambers, which can be configured for a number of options. The platform and wafer vacuum transfer supports on board dry pumps and many other advanced features and applications. Support equipment for the Tactras is smaller and uses less energy than previous 300mm platforms. The software and control system is fully integrated with online documentation and troubleshooting guides for reducing tool down time by assisting technicians with all common procedures on the tool.

• SCCM Poly Chamber, Vigus Chamber, After Treatment Chambers
• Maximum six chambers capability
• Flexible modular system expansion
• High throughput, compact design and lower CoO
• Ease of maintenance

• *Tactras is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.
• *SCCM is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.
• *Vigus is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.