The CLEAN TRACK LITHIUS is a 300mm/200mm coater/developer for the 45nm node and beyond. In line with rapidly advancing market needs, the CLEAN TRACK LITHIUS was been developed based on three concepts; improved processing, short cycle times, and enhanced network solutions. TEL CLEAN TRACK LITHIUS employs advanced process technology, which enable stable wafer processing. The CLEAN TRACK LITHIUS also achieves shorter lead and start-up times. The system is designed with a metrology integration block, and offers increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC.

• Lithography Process�iArF Immersion, ArF, KrF, i-line�j

• 150WPH�iWafer per Hour�jthroughput capable
• Thermally isolated design minimizes thermal interference
• Standard core network solution, Ingenio
• Full system integration of measurement & inspection tools
• LITHIUS i+ developed for immersion technology

• *CLEAN TRACK, LITHIUS and Ingenio are registered trademarks or trademarks of Tokyo Electron Limited in Japan and other countries.
• *Please refer to P17 for Timbre's optical measurement system.