The CLEAN TRACK ACT M is based on three separate high performance application modules; a photomask developer, resist coater, and a PEB(Post Exposure Bake)baker. The system provides sophisticated process control and techniques to meet the needs of advanced industry requirements of OPC(Optical Proximity Correction), phase shifting, and the use of chemically amplified resists. Based on TEL's market-dominating CLEAN TRACK ACT platform, the system offers improved within-mask and mask-to-mask process uniformity with a reduction in the number of defects.

• Lithography process for photo mask manufacturing

• Offers improved within-mask and mask-to-mask process uniformity
• Supports SMIF interface

• *CLEAN TRACK ACT is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries.