TOKYO- Tokyo Electron Limited (TEL) announced today that it will release its new 300mm high productivity coater/developer, CLEAN TRACKTM LITHIUS Pro™, in the fall of 2007. The CLEAN TRACK LITHIUS Pro is the latest coater/developer in the market-leading CLEAN TRACKTM LITHIUSTM series.

TEL developed the CLEAN TRACK LITHIUS Pro coater/developer in order to achieve dramatically higher productivity and reliability. The new system incorporates the advanced technology of TEL's currently available coater/developers, the CLEAN TRACK ACT™ and CLEAN TRACKTM LITHIUSTM series, which are in production at leading IC manufacturers worldwide.

CLEAN TRACK LITHIUS state-of-the-art features, including IngenioTM GL, CD Optimizer, and immersion process modules, will be integrated into the new coater/developer. Other key attributes include high throughput with a more compact footprint, as well as improved equipment maintainability and reliability.

Using integrated metrology tools, CLEAN TRACK LITHIUS Pro will immediately detect abnormal conditions and process changes in order to ensure optimal productivity. In keeping with TEL's commitment to the environment, the CLEAN TRACK LITHIUS Pro will also feature improved CoO (Cost-of-Ownership) by reducing utility usage and chemical consumption.

"The introduction of the CLEAN TRACK LITHIUS Pro addresses our customers' needs for increased productivity, higher reliability and compact size while incorporating all of the advanced technological capabilities of TEL's proven CLEAN TRACK LITHIUS platform," said Ken Sato, president of Tokyo Electron Limited.

TEL remains dedicated to pursuing cutting-edge technology, improving equipment productivity and providing products that meet our customers' future requirements. To learn more about the Lithius Pro, please visit us at Semicon Japan Booth # 2D-1001.