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Jul 9, 2004 TEL and IMEC Collaborate on Immersion LithographyTOKYO – Tokyo Electron Limited (TEL) announced Friday an agreement to collaborate with IMEC vzw (Headquarters: Leuven, Belgium, President & CEO: Gilbert Declerck), one of the world's leading independent research centers in microelectronics, in research of 193nm immersion lithography. TEL will be providing its coater/developer system, CLEAN TRACK ACT™ 12, to IMEC for the research, which will be installed in IMEC's new 300mm facility this summer. Since 1998, TEL has been collaborating with IMEC at their 200mm facility in Leuven, Belgium, for research into 193nm lithography. In addition to research of in-line CD metrology and 157nm lithography, they will begin research into immersion lithography. Immersion lithography has been receiving much interest within the semiconductor industry. It is predicted that 193nm immersion will replace 157nm as the next generation lithography to be used in mass production of semiconductor devices down to the 45nm node, and perhaps even beyond. Immersion lithography is a technique in which the space between the bottom lens element of the exposure tool and the wafer is filled with liquid instead of air. For 193nm immersion, water has been identified as the most ideal fluid. It is anticipated that this change in technique will impact defects and lithographic performance, such as CD and pattern profile control, by the absorption of water into the resist. Most resist companies are researching the use of protective top-coats to isolate the resist from the water and to optimize the resist chemistry. The implementation of these new chemicals requires enhancement of the coater/developer configuration and recipes. The research between TEL and IMEC will include an investigation of methods to fine-tune resist processing to meet the ITRS's goals for CD control and defect reduction. Collaboration with IMEC on 193nm immersion lithography research provides an excellent opportunity for TEL to develop new products by using actual exposure tools, with a short development cycle. TEL will apply the results from this collaborative research to offer value-added processing solutions to customers. *CLEAN TRACK ACT is a trademark of Tokyo Electron Limited. About IMEC |
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